時(shí)　間：2019年5月15日（周三）15:00

地　點(diǎn)：武漢大學(xué)櫻頂老圖書(shū)館

主講人：John Robertson教授 英國(guó)皇家科學(xué)院院士

題　目：Future of Electronics and where New Materials Theory Can Help

主講人簡(jiǎn)介：

John Robertson 教授，劍橋大學(xué)電子電氣工程系系主任，英國(guó)皇家科學(xué)院院士，美國(guó)物理協(xié)會(huì)（APS）會(huì)士，國(guó)際電氣與電子工程師學(xué)會(huì)（IEEE） 會(huì)士，Material Research Society（MRS）會(huì)士。主要研究方向包括材料物理學(xué)、界面科學(xué)以及表界面電子學(xué)，長(zhǎng)期從事類(lèi)金剛石薄膜材料、碳納米管、線(xiàn)材料和陶瓷薄膜材料領(lǐng)域研究，并取得了大量重要研究成果，先后獲得洪堡獎(jiǎng)等多項(xiàng)國(guó)際重要獎(jiǎng)項(xiàng)，發(fā)表學(xué)術(shù)論文600余篇，引用超過(guò)33000次，H指數(shù)高達(dá)106?，F(xiàn)擔(dān)任Jounral of Applied Physics, Physical Review Letters, Diamond Related Materials, Physica Status Solidi等期刊編輯委員，受邀參加重要國(guó)際會(huì)議報(bào)告100余次。

Brief Introduction of Professor John Robertson

Professor John Robertson is a Professor of Electronic Engineering at Cambridge University, UK. Robertson is a Fellow of the American Physical Society, the Institute of Electrical and Electronics Engineers (IEEE) and the Materials Research Society, and an Emeritus Editor of the journal Diamond and Related Materials. He was elected a Fellow of the Royal Society (FRS) in 2015, his certificate of election reads: "In recognition of his sustained contribution to the production and development of electronic devices".

He has published about 600 journal papers, with over 33,000 citations and is a ISI highly cited author in Materials Science. His research interests are in electronic materials in general, such materials for the CMOS gate stack, high dielectric constant oxides, thin film transistors including amorphous semiconducting oxides, carbon nanotubes, graphene, diamond-like carbon and CVD processes.

He is an Associate Editor of Journal of Applied Physics, and has been on the Editorial Board of Physical Review Letters.